Please use this identifier to cite or link to this item: https://scholar.dlu.edu.vn/handle/123456789/2073
Title: Effects of High Temperatures on Cell Reading, Programming, and Erasing of Schottky Barrier Charge-Trapping Memories
Authors: Jr-Jie Tsai
Wen-Fa Wu
Yu-Hsuan Chen
Hung-Jin Teng
Nguyễn, Đăng Chiến 
Chun-Hsing Shih
Keywords: Schottky barrier;charge-trapping memory;temperature effect
Issue Date: 2019
Journal: Microelectronic Engineering
Volume: 216
Pages: 111061
Abstract: 
This paper examines the temperature effect of Schottky barrier source/drain charge-trapping memories. The current-voltage curves and programming/erasing characteristics are experimentally investigated at room temperature and higher 85 °C and 125 °C. 2-D device simulations were performed to elucidate the physical mechanisms of Schottky barrier cell devices at high temperatures. For Schottky barrier charge-trapping cells, two different mechanisms of ambipolar conduction are classified: 1) thermionic emission and 2) Schottky barrier tunneling. The thermionic emission is susceptible to variations of high temperatures, leading to considerable shifts in logarithmic scale off-state drain-currents at low gate voltages. However, at adequately large gate voltages, the Schottky barrier tunneling plays a key role in contributing drain currents. The Schottky barriers and associated tunneling are relatively insensitive to the variations of device temperatures, preserving favorable temperature-insensitive programming and erasing Schottky barrier charge-trapping cells for use in the high-temperature automotive industry.
URI: https://scholar.dlu.edu.vn/handle/123456789/2073
DOI: 10.1109/TDMR.2019.2916483
Type: Bài báo đăng trên tạp chí thuộc ISI, bao gồm book chapter
Appears in Collections:Tạp chí (Khoa Vật lý và Kỹ thuật hạt nhân)

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